EUV spectroscopy of mass-limited Sn-doped laser micro-plasmas

Simi George; Chiew-Seng Koay; Kazutoshi Takenoshita; Robert Bernath; Moza Al-Rabban; Christian Keyser; Vivek Bakshi; Howard Scott; Martin Richardson

doi:10.1117/12.596781

6 May 2005 EUV spectroscopy of mass-limited Sn-doped laser micro-plasmas

Simi George, Chiew-Seng Koay, Kazutoshi Takenoshita, Robert Bernath, Moza Al-Rabban, Christian Keyser, Vivek Bakshi, Howard Scott, Martin Richardson

Author Affiliations +

Proceedings Volume 5751, Emerging Lithographic Technologies IX; (2005) https://doi.org/10.1117/12.596781
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

The 13 nm emission that results from laser plasmas created from tin targets, results from a milliard of transitions occurring in many ions of tin (Sn⁶⁺-Sn¹³⁺). Understanding the energy manifolds within these multiple states will further our ability to manipulate energy into the narrow emission band demanded by EUV Lithography. A combined experimental theoretical program is underway to measure and interpret the detailed EUV emission spectra from laser plasmas suitable for EUVL, particularly mass-limited droplet laser plasmas. We employ high resolution spectroscopy in the 2 - 60 nm wavelength regions to characterize the emission from the plasma. This is interpreted with the aid of combined hydrodynamic/ radiation transport computer models. The results of this study will have impact on the in-band EUV conversion efficiency, estimation of the out-of-band short-wavelength emission, and in the development of electron temperature plasma diagnostics.

Citation Download Citation

Simi George, Chiew-Seng Koay, Kazutoshi Takenoshita, Robert Bernath, Moza Al-Rabban, Christian Keyser, Vivek Bakshi, Howard Scott, and Martin Richardson "EUV spectroscopy of mass-limited Sn-doped laser micro-plasmas", Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); https://doi.org/10.1117/12.596781

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