Fabrication of III-V/polymer optical nanowires and nanogratings for nanophotonic devices

Denis Lauvernier; Jean-Pierre Vilcot; Didier Decoster

doi:10.1117/12.590418

25 March 2005 Fabrication of III-V/polymer optical nanowires and nanogratings for nanophotonic devices

Denis Lauvernier, Jean-Pierre Vilcot, Didier Decoster

Proceedings Volume 5732, Quantum Sensing and Nanophotonic Devices II; (2005) https://doi.org/10.1117/12.590418
Event: Integrated Optoelectronic Devices 2005, 2005, San Jose, California, United States

Abstract

One of the most important concerns in photonic integrated circuits is the reduction of the propagation path for optical interconnections leading so to a size decrease of active and passive components such as filters or multichannel wavelength (de)multiplexers. In this aim, it is necessary to use monomode optical waveguides with a high optical confinement via a strong index contrast. So the structures reported here consist in 300 nm-wide GaAs nano-wires and nano-gratings inserted in a polymer matrix. The technological process we present hereby allows fabricating symmetric waveguides with square cross-section.

Citation Download Citation

Denis Lauvernier, Jean-Pierre Vilcot, and Didier Decoster "Fabrication of III-V/polymer optical nanowires and nanogratings for nanophotonic devices", Proc. SPIE 5732, Quantum Sensing and Nanophotonic Devices II, (25 March 2005); https://doi.org/10.1117/12.590418

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