Dependence of the induced optical second-order nonlinearity profile of poled silica samples on poling conditions

Aydogan Ozcan; Michel J. F. Digonnet; Gordon S. Kino

doi:10.1117/12.589536

4 April 2005 Dependence of the induced optical second-order nonlinearity profile of poled silica samples on poling conditions

Aydogan Ozcan, Michel J. F. Digonnet, Gordon S. Kino

Author Affiliations +

Proceedings Volume 5723, Optical Components and Materials II; (2005) https://doi.org/10.1117/12.589536
Event: Integrated Optoelectronic Devices 2005, 2005, San Jose, California, United States

Abstract

Recently, we reported a fast and simple iterative inverse Fourier transform algorithm that allows for the first time to determine the second-order optical nonlinearity profile of thin films uniquely from a classical Maker fringe measurement. In this work, we have applied this novel technique to study the quantitative effects of the poling time and poling field on the second-order nonlinearity profile of thermally poled silica (Infrasil) samples. This study has enabled us to optimize the poling conditions and produce a record peak nonlinear coefficient d33 of 1.35 pm/V (poling at 9.6 MV/m and 280 °C for 15 minutes). This coefficient is 70% larger than typical values reported for conventional poling conditions (~5 MV/m for 15 minutes). This investigation also yielded values for a number of interesting poling parameters, in particular the diffusion depth of the positive species injected into the sample during poling as a function of poling conditions. These results are important for understanding the physics of the induced nonlinearity and for optimizing future optical devices in poled silica.

Citation Download Citation

Aydogan Ozcan, Michel J. F. Digonnet, and Gordon S. Kino "Dependence of the induced optical second-order nonlinearity profile of poled silica samples on poling conditions", Proc. SPIE 5723, Optical Components and Materials II, (4 April 2005); https://doi.org/10.1117/12.589536

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