Edge Recognition in SEM Metrology

J. F. Mancuso; S. Erasmus

doi:10.1117/12.949751

2 January 1986 Edge Recognition in SEM Metrology

J. F. Mancuso, S. Erasmus

Proceedings Volume 0565, Micron and Submicron Integrated Circuit Metrology; (1986) https://doi.org/10.1117/12.949751
Event: 29th Annual Technical Symposium, 1985, San Diego, United States

Abstract

Minimum linewidths of integrated circuits in mass production are currently (1985) just above lum. They are projected to decrease to 0.7um and then to 0.5um in the next decade. Linewidths currently must be controlled to Â±10% and it is predicted that linewidth control may need to be Â±5% in the future. To reach present goals, linewidth measurement systems with accuracies of at least 10% of linewidth (3 sigma) and, in some cases, ±5% (3 sigma) are required. Errors less than 0.05 to 0.lum (3 sigma) on lum lines and 0.025 to 0.05μm (3 sigma) on 0.5μm lines are therefore needed. This precision must be maintained over long time periods, with different operators and when thicknesses, profiles and other parameters of the structures change due to normal process variations.

Citation Download Citation

J. F. Mancuso and S. Erasmus "Edge Recognition in SEM Metrology", Proc. SPIE 0565, Micron and Submicron Integrated Circuit Metrology, (2 January 1986); https://doi.org/10.1117/12.949751

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