Exposure dose control for step-and-scan lithography

Liping Guo; Huijie Huang; Xiangzhao Wang; Dongqing Zhang

doi:10.1117/12.567919

27 January 2005 Exposure dose control for step-and-scan lithography

Liping Guo, Huijie Huang, Xiangzhao Wang, Dongqing Zhang

Proceedings Volume 5645, Advanced Microlithography Technologies; (2005) https://doi.org/10.1117/12.567919
Event: Photonics Asia, 2004, Beijing, China

Abstract

Exposure dose control technique in step-and-scan exposure lithography systems is discussed. The dose control principle for step-and-scan system is analyzed in depth. A dose control algorithm is proposed. Measurements of dose accuracy and repeatability are made on an experiment setup. Dose accuracy of 1.37% and dose repeatability of 0.31% are obtained using this dose control technique. Experiment results indicate that this dose control technique meets the requirement of sub-half-micron lithography.

Citation Download Citation

Liping Guo, Huijie Huang, Xiangzhao Wang, and Dongqing Zhang "Exposure dose control for step-and-scan lithography", Proc. SPIE 5645, Advanced Microlithography Technologies, (27 January 2005); https://doi.org/10.1117/12.567919

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