Paper
29 December 2004 Patterning silicon surfaces with covalently attached DNA at submicrometer resolution
Jian Hua Ouyang, Xin Sheng Zhao
Author Affiliations +
Proceedings Volume 5593, Nanosensing: Materials and Devices; (2004) https://doi.org/10.1117/12.570195
Event: Optics East, 2004, Philadelphia, Pennsylvania, United States
Abstract
A procedure is developed to modify silicon surface by organic monolayer films with designed micrometer patterns of different chemical functionalities, which is based on the photolithography and photoactivated reaction of alkenes with Si-H on the hydrogen-terminated silicon surface. Subsequent chemical modification of the micro-pattern can be devised. As an illustration, DNA probe arrays are formed with the spatial resolution limited only by the current photolithography technology. The hybridization of the patterned probes with complementary targets is demonstrated through fluorescence detection. This method is applicable to high throughput biochips.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jian Hua Ouyang and Xin Sheng Zhao "Patterning silicon surfaces with covalently attached DNA at submicrometer resolution", Proc. SPIE 5593, Nanosensing: Materials and Devices, (29 December 2004); https://doi.org/10.1117/12.570195
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KEYWORDS
Silicon

Natural surfaces

Optical lithography

Photoresist materials

Luminescence

Microelectronics

Current controlled current source

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