Potential high-power laser sources at 589-nm and 569-nm wavelengths for adaptive optics

Animesh Jha; Shaoxiong Shen; Lihui Huang; Jean-Paul Pique

doi:10.1117/12.565508

11 November 2004 Potential high-power laser sources at 589-nm and 569-nm wavelengths for adaptive optics

Animesh Jha, Shaoxiong Shen, Lihui Huang, Jean-Paul Pique

Proceedings Volume 5572, Optics in Atmospheric Propagation and Adaptive Systems VII; (2004) https://doi.org/10.1117/12.565508
Event: Remote Sensing, 2004, Maspalomas, Canary Islands, Spain

Abstract

The main aim of this paper is to demonstrate potential materials and fibres for 589 nm and 569 nm high-power laser sources, which can be developed by using rare-earth ions (Eu³⁺, Sm³⁺) as dopants in glass fibres. In this paper, we also discuss the advantages of using high-power excitation sources: for example the NIR semiconductors at 980 nm and 800 nm and high-power Yb-fibre laser based systems for high-power upconverted lasers. In this context the spectroscopic properties of Eu³⁺-Er³⁺ and Sm³⁺- based glass and fibre systems are also discussed in bulk oxide glasses and in fibre geometries for designing lasers at 589 nm and 569 nm for adaptive optics.

Citation Download Citation

Animesh Jha, Shaoxiong Shen, Lihui Huang, and Jean-Paul Pique "Potential high-power laser sources at 589-nm and 569-nm wavelengths for adaptive optics", Proc. SPIE 5572, Optics in Atmospheric Propagation and Adaptive Systems VII, (11 November 2004); https://doi.org/10.1117/12.565508

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