Fabrication of SiC:Ge: waveguide wavelength selector using ion implantation and laser deposition techniques

Abdalla M. Darwish; Brent D. Koplitz; Nadia Majeed; Trivia Frazier; Robert Combs; Daryush Ila; Nikolai V. Kukhtarev

doi:10.1117/12.559927

22 October 2004 Fabrication of SiC:Ge: waveguide wavelength selector using ion implantation and laser deposition techniques

Abdalla M. Darwish, Brent D. Koplitz, Nadia Majeed, Trivia Frazier, Robert Combs, Daryush Ila, Nikolai V. Kukhtarev

Author Affiliations +

Proceedings Volume 5560, Photorefractive Fiber and Crystal Devices: Materials, Optical Properties, and Applications X; (2004) https://doi.org/10.1117/12.559927
Event: Optical Science and Technology, the SPIE 49th Annual Meeting, 2004, Denver, Colorado, United States

Abstract

A waveguid-wavelength selector was fabricated using ion implanted SiC substrate and Ga/Ge thin film using laser ablation techniques. The device was used as a CO₂ laser lines selector. The theory of the operation is based on visibility of the CO₂ laser to produce a thermal grating which drives the optical selector with maximum efficiency of 46 MHz of laser offset between 10P20 and 10P18 CO₂ laser lines. The threshold of the thermal damage of the device was overcomed using a miniature heat exchanger, which is triggered by the excess of the thermal heat during the operation. The different potential use of the device will be presented as well.

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Abdalla M. Darwish, Brent D. Koplitz, Nadia Majeed, Trivia Frazier, Robert Combs, Daryush Ila, and Nikolai V. Kukhtarev "Fabrication of SiC:Ge: waveguide wavelength selector using ion implantation and laser deposition techniques", Proc. SPIE 5560, Photorefractive Fiber and Crystal Devices: Materials, Optical Properties, and Applications X, (22 October 2004); https://doi.org/10.1117/12.559927

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