Fabrication technology of ultraprecise mirror optics to realize hard x-ray nanobeam

Kazuto Yamauchi; Kazuya Yamamura; Hidekazu Mimura; Yasuhisa Sano; Satoshi Matsuyama; Hirokatsu Yumoto; Kazumasa Ueno; Masafumi Shibahara; Katsuyoshi Endo; Makina Yabashi; Kenji Tamasaku; Yoshinori Nishino; Tetsuya Ishikawa; Yuzo Mori

doi:10.1117/12.567501

18 October 2004 Fabrication technology of ultraprecise mirror optics to realize hard x-ray nanobeam

Kazuto Yamauchi, Kazuya Yamamura, Hidekazu Mimura, Yasuhisa Sano, Satoshi Matsuyama, Hirokatsu Yumoto, Kazumasa Ueno, Masafumi Shibahara, Katsuyoshi Endo, Makina Yabashi, Kenji Tamasaku, Yoshinori Nishino, Tetsuya Ishikawa, Yuzo Mori

Author Affiliations +

Proceedings Volume 5533, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications II; (2004) https://doi.org/10.1117/12.567501
Event: Optical Science and Technology, the SPIE 49th Annual Meeting, 2004, Denver, Colorado, United States

Abstract

In our previous study, we realized a hard X-ray focused beam having a 180nm×90nm focal size using fabricated ellip-tical mirrors. In this study, to realize a smaller focal size, more steeply curved elliptical mirrors with platinum-coated surfaces were fabricated. We showed that aspheric quality mirrors can be manufactured with recently developed ma-chining methods. We carried out line focusing tests on the elliptical mirror at the 1-km-long beamline of SPring-8. A full width at half maximum of 40 nm was achieved in the focal beam profile under the best focusing conditions.

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Kazuto Yamauchi, Kazuya Yamamura, Hidekazu Mimura, Yasuhisa Sano, Satoshi Matsuyama, Hirokatsu Yumoto, Kazumasa Ueno, Masafumi Shibahara, Katsuyoshi Endo, Makina Yabashi, Kenji Tamasaku, Yoshinori Nishino, Tetsuya Ishikawa, and Yuzo Mori "Fabrication technology of ultraprecise mirror optics to realize hard x-ray nanobeam", Proc. SPIE 5533, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications II, (18 October 2004); https://doi.org/10.1117/12.567501

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