Quality Control And Process Monitoring With FT-IR Spectroscopy

G. L. Ritter; S. R. Lowry; C. R. Anderson

doi:10.1117/12.970859

20 December 1985 Quality Control And Process Monitoring With FT-IR Spectroscopy

G. L. Ritter, S. R. Lowry, C. R. Anderson

Proceedings Volume 0553, Fourier and Computerized Infrared Spectroscopy; (1985) https://doi.org/10.1117/12.970859
Event: 1985 International Conference on Fourier and Computerized Infrared Spectroscopy, 1985, Ottawa, Canada

Abstract

The sensitivity and speed of FT-IR spectroscopy have always appealed to the quality control and process monitoring community. However, the high cost and large size of research grade instruments have limited the use of FT-IR in production environments. The development of smaller, more rugged spectrometers has created renewed interest in these applications. To meet the interest three areas become critical. •The spectrometer must have minimum down time and must be simple to service. • Quantitative analysis must be available so that an analysis may be configured easily. • It must be possible to transfer information from the spectrometer to a computer system for archiving or decision making.

Citation Download Citation

G. L. Ritter, S. R. Lowry, and C. R. Anderson "Quality Control And Process Monitoring With FT-IR Spectroscopy", Proc. SPIE 0553, Fourier and Computerized Infrared Spectroscopy, (20 December 1985); https://doi.org/10.1117/12.970859

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