Silicon immersion gratings for very high-resolution infrared spectroscopy

Daniel Ludlow McDavitt; Jian Ge; Shane Miller; Junfeng Wang

doi:10.1117/12.552028

24 September 2004 Silicon immersion gratings for very high-resolution infrared spectroscopy

Daniel Ludlow McDavitt, Jian Ge, Shane Miller, Junfeng Wang

Proceedings Volume 5494, Optical Fabrication, Metrology, and Material Advancements for Telescopes; (2004) https://doi.org/10.1117/12.552028
Event: SPIE Astronomical Telescopes + Instrumentation, 2004, Glasgow, United Kingdom

Abstract

In our group, development of large format silicon immersion gratings with sizes up to 4 inches in diameter is a routine practice. The first silicon anamorphic immersion grating has an 80x50 mm² etched grating area, a 63.5° blazed angle and a 5.4 l/mm groove density (or 185 μm period) on a 30mm thick silicon substrate. The groove density is about 4 times coarser than any existing commercial echelle grating, allowing a complete coverage of a cross-dispersed echelle spectrum on a 1k x 1k IR array at R = 220,000 in the K band. The optical measurements show the grating has a high quality wavefront and surface. The rms wavefront error is 0.125 waves and the integrated scattered light is ~1% at 0.6328 nm. A silicon immersion grating with an 85x50 mm² etched area, a 54.7° blazed angle and 16.1 l/mm groove density on a 40 mm thickness allows for complete wavelength coverage of 1.2-2.4 μm on a 2kx2k IR array. We are in the middle of processing a silicon disk with a 6 inch diameter and 2.5 inch thickness to make a large format silicon immersion grating for the Gemini next generation Advanced Cryogenic Echelle Spectrograph (ACES) and space applications.

Citation Download Citation

Daniel Ludlow McDavitt, Jian Ge, Shane Miller, and Junfeng Wang "Silicon immersion gratings for very high-resolution infrared spectroscopy", Proc. SPIE 5494, Optical Fabrication, Metrology, and Material Advancements for Telescopes, (24 September 2004); https://doi.org/10.1117/12.552028

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