Paper
16 August 2004 Micromachined tunable optical microfilters design and experimental processing
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Abstract
In this paper we present the design and the experiments performed to obtain a micromechanical voltage tunable Fabry-Perot interferometer integrated with a p-n photodiode on a silicon substrate. It can be used as a voltage tunable filter for the input radiation or as a voltage controlled attenuator to regulate the light from a monochromatic source. Different solution have been analyzed and experimented. The top mirror of the Fabry-Perot cavity is a doped poly-Si or Au/SiO2 movable membrane, electrostatically actuated, obtained using Si micromachining. A complex design process was performed: optical, electomechanical and technological. All these phases were performed interactively. Different materials were considered in order to perform an optimum design. Experimental micromachined interferometers were obtained using two techniques: (1) surface micromachining, and (2) anisotropic etching of (111)-oriented Si wafers, combined with an isotropic pre-etching step. These processes were optimized and matched to the photodiode fabrication process. Monolithic integrated interferometers coupled to p-n photodiodes were obtained.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Dana Cristea, Raluca Muller, Philippe Arguel, Mihai Kusko, Catalin Tibeica, and Dimitrtis Syvridis "Micromachined tunable optical microfilters design and experimental processing", Proc. SPIE 5455, MEMS, MOEMS, and Micromachining, (16 August 2004); https://doi.org/10.1117/12.545470
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KEYWORDS
Mirrors

Silicon

Photodiodes

Interferometers

Anisotropic etching

Semiconducting wafers

Optical lithography

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