Improving photomask surface properties through a combination of dry and wet cleaning steps

Florence O. Eschbach; Daniel Tanzil; Michael Kovalchick; Uwe U. Dietze; Min Liu; Fei Xu

doi:10.1117/12.557700

20 August 2004 Improving photomask surface properties through a combination of dry and wet cleaning steps

Florence O. Eschbach, Daniel Tanzil, Michael Kovalchick, Uwe U. Dietze, Min Liu, Fei Xu

Proceedings Volume 5446, Photomask and Next-Generation Lithography Mask Technology XI; (2004) https://doi.org/10.1117/12.557700
Event: Photomask and Next Generation Lithography Mask Technology XI, 2004, Yokohama, Japan

Abstract

As originally submitted

Citation Download Citation

Florence O. Eschbach, Daniel Tanzil, Michael Kovalchick, Uwe U. Dietze, Min Liu, and Fei Xu "Improving photomask surface properties through a combination of dry and wet cleaning steps", Proc. SPIE 5446, Photomask and Next-Generation Lithography Mask Technology XI, (20 August 2004); https://doi.org/10.1117/12.557700

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