Study of line edge roughness using continuous wavelet transform for 65-nm node

Lin-Hung Shiu; Chun-Kuang Chen; Tsai-Sheng Gau; Burn-Jeng Lin

doi:10.1117/12.536649

28 May 2004 Study of line edge roughness using continuous wavelet transform for 65-nm node

Lin-Hung Shiu, Chun-Kuang Chen, Tsai-Sheng Gau, Burn-Jeng Lin

Proceedings Volume 5377, Optical Microlithography XVII; (2004) https://doi.org/10.1117/12.536649
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

This paper introduces the continuous wavelet transform (CWT) techniques to characterize spatial frequencies of LER. A 890 nm length of line pattern was dissected with 448 measured-points along line-edge from the image of scanning electron microscope (SEM), and the dissection of measurement points is around 2 nm. The measured data of line-edge roughness (LER) were transformed to spatial power spectrum with commercial software packages of wavelet transform, and the characterization of spatial frequency correlated to lithographic process parameters, such as the soft-bake (SB) temperature, the numerical aperture (NA), the temperature of post-exposure baking (PEB), and the molecular weight of resist (MW) were investigated. The higher NA and lower SB give a significant improvement from low spatial frequency (long range LER) to higher one (short range LER). However, both the higher temperature of PEB and lower MW improve edge roughness only on long range order roughness (lower spatial frequency).

Citation Download Citation

Lin-Hung Shiu, Chun-Kuang Chen, Tsai-Sheng Gau, and Burn-Jeng Lin "Study of line edge roughness using continuous wavelet transform for 65-nm node", Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); https://doi.org/10.1117/12.536649

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