Alignment offset analyzer against wafer-induced shift (WIS)

Takahiro Matsumoto; Hideki Ina; Koichi Sentoku

doi:10.1117/12.534757

24 May 2004 Alignment offset analyzer against wafer-induced shift (WIS)

Takahiro Matsumoto, Hideki Ina, Koichi Sentoku

Proceedings Volume 5375, Metrology, Inspection, and Process Control for Microlithography XVIII; (2004) https://doi.org/10.1117/12.534757
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

In lithography, the alignment error can be categorized into three factors. The first factor is called as Tool Induced Shift (TIS). The second is Wafer Induced Shift (WIS) and the third is the interaction between TIS and WIS. About TIS, we have defined a new evaluation criterion. About WIS, we have shown an error analyzer to quantify and compensate the alignment error using Atomic Force Microscope (AFM) and optical simulation. We have called this analyzer as 'Alignment Offset Analyzer'. This analyzer has the following features. The topography of an alignment mark and resist surface on the alignment mark are measured individually by the AFM. The two topography data are wrapping over in a signal simulator. Using the wrapped topography, an alignment signal and an alignment measurement offset are calculated. Since the alignment offset can also be calculated before exposure sequence, the alignment offset can be inputted to exposure tool without send-ahead wafers. This time we report the accuracy of the Alignment Offset Analyzer. The alignment offset measured by an exposure tool and the calculated one above mentioned showed a good agreement, and the difference was several nm.

Citation Download Citation

Takahiro Matsumoto, Hideki Ina, and Koichi Sentoku "Alignment offset analyzer against wafer-induced shift (WIS)", Proc. SPIE 5375, Metrology, Inspection, and Process Control for Microlithography XVIII, (24 May 2004); https://doi.org/10.1117/12.534757

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available