Origins of debris and mitigation through a secondary RF plasma system for discharge-produced EUV sources

Ernesto Vargas Lopez; Brian E. Jurczyk; Michael A. Jaworski; Martin J. Neumann; David N. Ruzic

doi:10.1117/12.536405

20 May 2004 Origins of debris and mitigation through a secondary RF plasma system for discharge-produced EUV sources

Ernesto Vargas Lopez, Brian E. Jurczyk, Michael A. Jaworski, Martin J. Neumann, David N. Ruzic

Proceedings Volume 5374, Emerging Lithographic Technologies VIII; (2004) https://doi.org/10.1117/12.536405
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

RF plasma based mitigation has been studied as an improved debris mitigation scheme for extreme ultraviolet (EUV) sources. The RF plasma ionizes sputtered neutral debris and, when used in conjunction with a collimator (also known as a foil trap), inhibits that debris from reaching the collector optics. An ionization fraction of 61±3% has been measured. In addition, increased scattering of the ion component of the debris has led to a decrease in erosive flux reaching the diagnostics. Results from in-situ high-precision quartz crystal oscillators, ex-situ surface characterization (Auger, XPS), and secondary plasma characterization is presented for a series of mitigation schemes, including a foil trap in conjunction with the RF plasma.

Citation Download Citation

Ernesto Vargas Lopez, Brian E. Jurczyk, Michael A. Jaworski, Martin J. Neumann, and David N. Ruzic "Origins of debris and mitigation through a secondary RF plasma system for discharge-produced EUV sources", Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); https://doi.org/10.1117/12.536405

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