Paper
29 December 2003 Diamond optics: fabrication and applications
Fredrik K. Nikolajeff, Mikael Karlsson
Author Affiliations +
Abstract
We have developed a method for fabricating almost any type of optical surfaces in diamond. The method consists of the following steps: First, a polymer film, spun onto diamond substrates of optical quality, is patterned by lithographic processes. Next, the surface relief is transferred into the underlying diamond by use of inductively coupled plasma dry etching in an oxygen/argon chemistry. Using this technique, we have successfully demonstrated the fabrication of diamond spherical microlenses, blazed gratings, Fresnel lenses, subwavelength gratings and diffractive fan-out elements. Applications for diamond optics include space technology, high power lasers and optoelectronic devices. In a first real world application we have manufactured subwavelength antireflective gratings which will be tested for use with a future space telescope. The wavelength region of interest will be in the far-IR. Our fabricated antireflective gratings increased the transmitted radiation from 71% to 98% between wavelengths of 21.5 μm and 26.5 μm.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Fredrik K. Nikolajeff and Mikael Karlsson "Diamond optics: fabrication and applications", Proc. SPIE 5347, Micromachining Technology for Micro-Optics and Nano-Optics II, (29 December 2003); https://doi.org/10.1117/12.537595
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Diamond

Etching

Chemical elements

Microlens

Gas lasers

Plasma etching

Antireflective coatings

RELATED CONTENT

RAR nano-textured diamond pulsed LIDT
Proceedings of SPIE (December 02 2022)
Identifying new absorber materials for EUV photomasks
Proceedings of SPIE (November 21 2023)
Diamond micro-optics
Proceedings of SPIE (November 03 2003)
A New Class Of Bilevel And Mono Level Positive Resist...
Proceedings of SPIE (April 18 1985)
In-Situ Diagnostics For Plasma Processing
Proceedings of SPIE (March 15 1989)
New plasma processes for antireflective structures on plastics
Proceedings of SPIE (September 25 2008)

Back to Top