Induced ESD damage on photomasks: a reticle evaluation

Andrew C. Rudack; Michael Pendley; Patrick Gagnon; Lawrence Levit

doi:10.1117/12.518126

17 December 2003 Induced ESD damage on photomasks: a reticle evaluation

Andrew C. Rudack, Michael Pendley, Patrick Gagnon, Lawrence Levit

Proceedings Volume 5256, 23rd Annual BACUS Symposium on Photomask Technology; (2003) https://doi.org/10.1117/12.518126
Event: Photomask Technology, 2003, Monterey, California, United States

Abstract

An Electric-field (E-field) exposure tool for Photomasks was designed, assembled, then utilized to subject 250 nanometer technology node reticles to variable electric fields. A similar study had been demonstrated using the Canary Reticle. The goal was to induce an Electrostatic Discharge (ESD), and attempt to damage the reticle's chrome structures via the Field Induced Damage Model. Electrostatic Discharge emits a radio wave in the 100 MHz to 2.0 GHz frequency range, which can be detected using a Digital Sampling Oscilloscope and antenna. Once detected via radio wave sampling techniques, the Field Induced Damage is evaluated on a KLA STARlight inspection tool, and a damage map provided. A Digital Instruments Atomic Force Microscope utilizes the damage map to locate defects for further evaluation.

Citation Download Citation

Andrew C. Rudack, Michael Pendley, Patrick Gagnon, and Lawrence Levit "Induced ESD damage on photomasks: a reticle evaluation", Proc. SPIE 5256, 23rd Annual BACUS Symposium on Photomask Technology, (17 December 2003); https://doi.org/10.1117/12.518126

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