Development of a new PSM film system for 157-nm extensible to high-transmission 193 nm lithography

Hans W. Becker; Jay Chey; Frank Sobel; Frank Schmidt; Markus Renno; Ute Buttgereit; Marie Angelopoulos; Guenter Hess; Konrad Knapp

doi:10.1117/12.518339

17 December 2003 Development of a new PSM film system for 157-nm extensible to high-transmission 193 nm lithography

Hans W. Becker, Jay Chey, Frank Sobel, Frank Schmidt, Markus Renno, Ute Buttgereit, Marie Angelopoulos, Guenter Hess, Konrad Knapp

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Proceedings Volume 5256, 23rd Annual BACUS Symposium on Photomask Technology; (2003) https://doi.org/10.1117/12.518339
Event: Photomask Technology, 2003, Monterey, California, United States

Abstract

A new attenuated phase shifting film system for 157 nm lithography is presented. The system is designed for 6% transmission but is tunable to higher values. Tests for laser stability and chemical durability show excellent performance. First results of defect density and phase and transmission homogeneity are presented. The phase shifting film achieves a high etch selectivity to the substrate. The film system is extensible to be used as a high transmission phase shifter for 193 nm lithography. Further it is feasible to repair the film system using electron beam repair technology.

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Hans W. Becker, Jay Chey, Frank Sobel, Frank Schmidt, Markus Renno, Ute Buttgereit, Marie Angelopoulos, Guenter Hess, and Konrad Knapp "Development of a new PSM film system for 157-nm extensible to high-transmission 193 nm lithography", Proc. SPIE 5256, 23rd Annual BACUS Symposium on Photomask Technology, (17 December 2003); https://doi.org/10.1117/12.518339

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