DUV mask writer for BEOL 90-nm technology layers

Dongsung Hong; Prakash Krishnan; Dianna Coburn; Nazneen Jeewakhan; Shengqi Xie; Joshua Broussard; Bradley Ferguson; Kent G. Green; Peter Buck; Curt A. Jackson; Larry Martinez

doi:10.1117/12.518051

17 December 2003 DUV mask writer for BEOL 90-nm technology layers

Dongsung Hong, Prakash Krishnan, Dianna Coburn, Nazneen Jeewakhan, Shengqi Xie, Joshua Broussard, Bradley Ferguson, Kent G. Green, Peter Buck, Curt A. Jackson, Larry Martinez

Author Affiliations +

Proceedings Volume 5256, 23rd Annual BACUS Symposium on Photomask Technology; (2003) https://doi.org/10.1117/12.518051
Event: Photomask Technology, 2003, Monterey, California, United States

Abstract

Mask CD resolution and uniformity requirements for back end of line (BEOL) layers for the 90nm Technology Node push the capability of I-line mask writers; yet, do not require the capability offered by more expensive 50KeV ebeam mask writers. This suite of mask layers seems to be a perfect match for the capabilities of the DUV mask writing tools, which offer a lower cost option to the 50KeV platforms. This paper will evaluate both the mask and wafer results from all three platforms of mask writers (50KeV VSB,ETEC Alta 4300TM DUV laser and ETEC Alta 3500TM I-line laser) for a Cypress 90nm node Metal 1 layer, and demonstrate the benefits of the DUV platform with no change to OPC for this layer.

Citation Download Citation

Dongsung Hong, Prakash Krishnan, Dianna Coburn, Nazneen Jeewakhan, Shengqi Xie, Joshua Broussard, Bradley Ferguson, Kent G. Green, Peter Buck, Curt A. Jackson, and Larry Martinez "DUV mask writer for BEOL 90-nm technology layers", Proc. SPIE 5256, 23rd Annual BACUS Symposium on Photomask Technology, (17 December 2003); https://doi.org/10.1117/12.518051

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