Advanced FIB mask repair technology for 90-nm/ArF lithography: III

Yoshiyuki Tanaka; Yasutoshi Itou; Nobuyuki Yoshioka; Ryoji Hagiwara; Anto Yasaka; Osamu Takaoka; Tomokazu Kozakai; Yoshihiro Koyama; Hiroshi Sawaragi; Yasuhiko Sugiyama; Masashi Muramatsu; Toshio Doi; Katsumi Suzuki; Mamoru Okabe; Masashi Shinohara; Osamu Matsuda; Kazuo Aita; Tatsuya Adachi; Yasutaka Morikawa; Masaharu Nishiguchi; Yasushi Satoh; Naoya Hayashi

doi:10.1117/12.518026

17 December 2003 Advanced FIB mask repair technology for 90-nm/ArF lithography: III

Yoshiyuki Tanaka, Yasutoshi Itou, Nobuyuki Yoshioka, Ryoji Hagiwara, Anto Yasaka, Osamu Takaoka, Tomokazu Kozakai, Yoshihiro Koyama, Hiroshi Sawaragi, Yasuhiko Sugiyama, Masashi Muramatsu, Toshio Doi, Katsumi Suzuki, Mamoru Okabe, Masashi Shinohara, Osamu Matsuda, Kazuo Aita, Tatsuya Adachi, Yasutaka Morikawa, Masaharu Nishiguchi, Yasushi Satoh, Naoya Hayashi

Author Affiliations +

Proceedings Volume 5256, 23rd Annual BACUS Symposium on Photomask Technology; (2003) https://doi.org/10.1117/12.518026
Event: Photomask Technology, 2003, Monterey, California, United States

Abstract

The SIR5000 mask repair system was developed with an FIB system featuring new ion optics, modified SED detectors, new platform software and optimized repair processes to repair 130nm/ArF generation masks. Thereafter we have continuously improved it for 90nm/ArF lithography and evaluated its performance such as edge placement repeatability, lithography simulation and printing tests. The transmittance of FIB imaging area is more than 95% over 70 times scans, and the printing result data also shows that the imaging damage by FIB scans little affect CD until around 70 times. The ED windows of both repaired clear and opaque defects almost overlap non repaired reference ones, and they show that the printing performance of repaired mask does not have any printing issues. Consequently, we demonstrated that the improved SIR5000 capability has reached the 90nm node mask technology requirement.

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Yoshiyuki Tanaka, Yasutoshi Itou, Nobuyuki Yoshioka, Ryoji Hagiwara, Anto Yasaka, Osamu Takaoka, Tomokazu Kozakai, Yoshihiro Koyama, Hiroshi Sawaragi, Yasuhiko Sugiyama, Masashi Muramatsu, Toshio Doi, Katsumi Suzuki, Mamoru Okabe, Masashi Shinohara, Osamu Matsuda, Kazuo Aita, Tatsuya Adachi, Yasutaka Morikawa, Masaharu Nishiguchi, Yasushi Satoh, and Naoya Hayashi "Advanced FIB mask repair technology for 90-nm/ArF lithography: III", Proc. SPIE 5256, 23rd Annual BACUS Symposium on Photomask Technology, (17 December 2003); https://doi.org/10.1117/12.518026

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