Design of high-average-power clean EUV light source based on laser-produced Xenon plasma

Akira Endo; Tamotsu Abe; Takashi Suganuma; Yousuke Imai; Hiroshi Someya; Hideo Hoshino; Nakano Masaki; Georg Soumagne; Hiroshi Komori; Yuichi Takabayashi; Hakaru Mizoguchi

doi:10.1117/12.503434

7 January 2004 Design of high-average-power clean EUV light source based on laser-produced Xenon plasma

Akira Endo, Tamotsu Abe, Takashi Suganuma, Yousuke Imai, Hiroshi Someya, Hideo Hoshino, Nakano Masaki, Georg Soumagne, Hiroshi Komori, Yuichi Takabayashi, Hakaru Mizoguchi

Author Affiliations +

Proceedings Volume 5196, Laser-Generated and Other Laboratory X-Ray and EUV Sources, Optics, and Applications; (2004) https://doi.org/10.1117/12.503434
Event: Optical Science and Technology, SPIE's 48th Annual Meeting, 2003, San Diego, California, United States

Abstract

Important design factors are evaluated for a high average power, clean EUV light source by laser produced plasma. The basic requirements are high average power, high stability, and long lifetime, and these are closely relating with absorption loss by xenon, repetition rate, and fast ion generation. These subjects are evaluated based on experimental data and analytical model of a laser produced xenon plasma.

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Akira Endo, Tamotsu Abe, Takashi Suganuma, Yousuke Imai, Hiroshi Someya, Hideo Hoshino, Nakano Masaki, Georg Soumagne, Hiroshi Komori, Yuichi Takabayashi, and Hakaru Mizoguchi "Design of high-average-power clean EUV light source based on laser-produced Xenon plasma", Proc. SPIE 5196, Laser-Generated and Other Laboratory X-Ray and EUV Sources, Optics, and Applications, (7 January 2004); https://doi.org/10.1117/12.503434

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