EPL mask data conversion system EPLON

Kokoro Kato; Kuninori Nishizawa; Tamae Haruki; Tadao Inoue

doi:10.1117/12.504245

28 August 2003 EPL mask data conversion system EPLON

Kokoro Kato, Kuninori Nishizawa, Tamae Haruki, Tadao Inoue

Proceedings Volume 5130, Photomask and Next-Generation Lithography Mask Technology X; (2003) https://doi.org/10.1117/12.504245
Event: Photomask and Next Generation Lithography Mask Technology X, 2003, Yokohama, Japan

Abstract

EPLON is the name of a system that we have been developing as a data conversion system for EPL masks in order to meet the requirements of EPL stencil masks. In our paper we presented in PMJ2002, we proved that our system could convert the whole chip data. However we still had some problems to overcome, one of which is a problem of conversion time and another issue is a data volume problem. This paper presents the features of our multi process computation method and the data compaction with building a hierarchy from the flattened data.

Citation Download Citation

Kokoro Kato, Kuninori Nishizawa, Tamae Haruki, and Tadao Inoue "EPL mask data conversion system EPLON", Proc. SPIE 5130, Photomask and Next-Generation Lithography Mask Technology X, (28 August 2003); https://doi.org/10.1117/12.504245

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