Does technology acceleration equate to mask cost acceleration?

Walter J. Trybula; Brian J. Grenon

doi:10.1117/12.485285

2 July 2003 Does technology acceleration equate to mask cost acceleration?

Walter J. Trybula, Brian J. Grenon

Proceedings Volume 5043, Cost and Performance in Integrated Circuit Creation; (2003) https://doi.org/10.1117/12.485285
Event: Advanced Microelectronic Manufacturing, 2003, Santa Clara, CA, United States

Abstract

The technology acceleration of the ITRS Roadmap has many implications on both the semiconductor sup-plier community and the manufacturers. INTERNATIONAL SEMATECH has revaluated the projected cost of advanced technology masks. Building on the methodology developed in 1996 for mask costs, this work provided a critical review of mask yields and factors relating to the manufacture of photolithography masks. The impact of the yields provided insight into the learning curve for leading edge mask manufac-turing. The projected mask set cost was surprising, and the ability to provide first and second year cost estimates provided additional information on technology introduction. From this information, the impact of technology acceleration can be added to the projected yields to evaluate the impact on mask costs.

Citation Download Citation

Walter J. Trybula and Brian J. Grenon "Does technology acceleration equate to mask cost acceleration?", Proc. SPIE 5043, Cost and Performance in Integrated Circuit Creation, (2 July 2003); https://doi.org/10.1117/12.485285

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