Spectral dynamics analysis of utlra-line-narrowed F2 laser

Takahito Kumazaki; Osamu Wakabayashi; Ryoichi Nohdomi; Tatsuya Ariga; Hidenori Watanabe; Kazuaki Hotta; Hakaru Mizoguchi; Hiroki Tanaka; Akihiko Takahashi; Tatsuo Okada

doi:10.1117/12.485381

26 June 2003 Spectral dynamics analysis of utlra-line-narrowed F₂ laser

Takahito Kumazaki, Osamu Wakabayashi, Ryoichi Nohdomi, Tatsuya Ariga, Hidenori Watanabe, Kazuaki Hotta, Hakaru Mizoguchi, Hiroki Tanaka, Akihiko Takahashi, Tatsuo Okada

Author Affiliations +

Proceedings Volume 5040, Optical Microlithography XVI; (2003) https://doi.org/10.1117/12.485381
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

We have developed an ultra-line-narrowed, high-repetition-rate, high-power injection-locked F₂ laser system for 157 nm dioptric projection systems under the ASET project “F₂ Laser Lithography Development Project”. A spectral bandwidth of < 0.2 pm (FWHM), an output power of > 25 W, and an energy stability (3-sigma) of < 10 % at 5 kHz repetition rate was successfully obtained by using a low-power ultra-line-narrowed oscillator laser and a high-gain multi-pass amplifier laser. These parameters satisfy the requirements of exposure tools. A numerical simulation code that can simulate the spectral dynamics of the F₂ laser under different operation modes such as free running operation, line-narrowed operation, and injection-locked operation, has also been developed. Using this simulation code, it is found that the instantaneous spectral bandwidth narrows monotonously during the laser pulse, and a narrower spectral output can be obtained by seeding the tail area of the line-narrowed F₂ laser pulse. And the line-narrowing operation of the oscillator laser and the behavior of the injection-locked laser system can be predicted very precisely with this simulation code. The development of F₂laser for microlithography will be accelerated by this new simulation code.

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Takahito Kumazaki, Osamu Wakabayashi, Ryoichi Nohdomi, Tatsuya Ariga, Hidenori Watanabe, Kazuaki Hotta, Hakaru Mizoguchi, Hiroki Tanaka, Akihiko Takahashi, and Tatsuo Okada "Spectral dynamics analysis of utlra-line-narrowed F₂ laser", Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); https://doi.org/10.1117/12.485381

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KEYWORDS

Pulsed laser operation

Oscillators

Optical simulations

Laser systems engineering

Laser development

Amplifiers

Numerical simulations

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