Aberration optimizing system using Zernike sensitivity method

Yasuo Shimizu; Tadashi Yamaguchi; Kousuke Suzuki; Yuji Shiba; Tomoyuki Matsuyama; Shigeru Hirukawa

doi:10.1117/12.485459

26 June 2003 Aberration optimizing system using Zernike sensitivity method

Yasuo Shimizu, Tadashi Yamaguchi, Kousuke Suzuki, Yuji Shiba, Tomoyuki Matsuyama, Shigeru Hirukawa

Proceedings Volume 5040, Optical Microlithography XVI; (2003) https://doi.org/10.1117/12.485459
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

We introduce a projection lens adjustment procedure that is customer application oriented. This technique is based on the simulated imaging performance using Zernike sensitivity, the measurement results of wavefront aberration and wavefront change by lens element position change. This system finds the optimum combination of lens position where the amount of specific imaging performance error is in tolerance. In this paper, the idea of optimization and some optimization results are shown.

Citation Download Citation

Yasuo Shimizu, Tadashi Yamaguchi, Kousuke Suzuki, Yuji Shiba, Tomoyuki Matsuyama, and Shigeru Hirukawa "Aberration optimizing system using Zernike sensitivity method", Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); https://doi.org/10.1117/12.485459

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