Pattern shape comparison methods using SEM image

Takahiro Ikeda; Toshiya Kotani; Takashi Sato; Kusuo Ueno; Ryoichi Matsuoka

doi:10.1117/12.482831

2 June 2003 Pattern shape comparison methods using SEM image

Takahiro Ikeda, Toshiya Kotani, Takashi Sato, Kusuo Ueno, Ryoichi Matsuoka

Proceedings Volume 5038, Metrology, Inspection, and Process Control for Microlithography XVII; (2003) https://doi.org/10.1117/12.482831
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

We have developed a new system, 'PF-3000', which realizes the pattern shape comparison between CAD layout data and CD-SEM images. Comparison results are expressed as the difference of edge location and area in this system. Moreover, we investigated different methods of shape comparison. Fourier descriptor is one of the most useful method.

Citation Download Citation

Takahiro Ikeda, Toshiya Kotani, Takashi Sato, Kusuo Ueno, and Ryoichi Matsuoka "Pattern shape comparison methods using SEM image", Proc. SPIE 5038, Metrology, Inspection, and Process Control for Microlithography XVII, (2 June 2003); https://doi.org/10.1117/12.482831

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