Designing a reference for CD-SEM magnification calibration

Albert Sicignano; Arkady V. Nikitin; Dmitriy Y. Yeremin; Matthew Sandy; E. Tim Goldburt

doi:10.1117/12.485018

2 June 2003 Designing a reference for CD-SEM magnification calibration

Albert Sicignano, Arkady V. Nikitin, Dmitriy Y. Yeremin, Matthew Sandy, E. Tim Goldburt

Proceedings Volume 5038, Metrology, Inspection, and Process Control for Microlithography XVII; (2003) https://doi.org/10.1117/12.485018
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

In order to design a reference suitable for performing CD-SEM magnification calibration with high precision and accuracy it is necessary to first identify the relevant critical issues. We will discuss why the magnification calibration reference is a key challenge; why CD-SEM magnification calibration is not trivial; and why a suitable magnification calibration reference does not currently exist. We will identify the criticalities for the above issues. We will present a novel solution leading to design criteria for a universal CD-SEM magnification calibration reference.

Citation Download Citation

Albert Sicignano, Arkady V. Nikitin, Dmitriy Y. Yeremin, Matthew Sandy, and E. Tim Goldburt "Designing a reference for CD-SEM magnification calibration", Proc. SPIE 5038, Metrology, Inspection, and Process Control for Microlithography XVII, (2 June 2003); https://doi.org/10.1117/12.485018

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