Nonlinear response of metal nanoparticle embedded in insulators by 60-keV negative ion implantation

Yoshihiko Takeda; Jing Lu; Naoki Kishimoto

doi:10.1117/12.469048

13 November 2002 Nonlinear response of metal nanoparticle embedded in insulators by 60-keV negative ion implantation

Yoshihiko Takeda, Jing Lu, Naoki Kishimoto

Proceedings Volume 4934, Smart Materials II; (2002) https://doi.org/10.1117/12.469048
Event: SPIE's International Symposium on Smart Materials, Nano-, and Micro- Smart Systems, 2002, Melbourne, Australia

Abstract

Linear and nonlinear optical properties of Ta nanoparticle composites, fabricated by negative ion implantation, were studied in the visible range. Negative Ta ions of 60 keV were implanted into amorphous SiO₂ and crystalline TiO₂ with a total dose of 3× 10¹⁶ ions/cm². Optical absorption evidently indicated a surface plasmon peak around 2 eV and the peak resulted from formation of nanoparticles embedded in the matrix. The plasmon peak shifted with dependening on the refractive index of the substrates. The laser-induced transient absorption was measured with the technique of pump-probe femtosecond spectroscopy. The transient absorption of the Ta nanoparticle composite in SiO₂ recovered in several picoseconds due to energy transfer from the excited electrons to the lattice via the electron-phonon interaction. The transient response was comparable to that of the noble metals. The electron-phonon coupling was evaluated by the two-temperature model and the coupling constant yielded a value of g = 3.1 × 10¹⁸ W/m³K. The Ta nanoparticle composite has the advantage of thermal stability in comparison with Cu nanoparticle composites.

Citation Download Citation

Yoshihiko Takeda, Jing Lu, and Naoki Kishimoto "Nonlinear response of metal nanoparticle embedded in insulators by 60-keV negative ion implantation", Proc. SPIE 4934, Smart Materials II, (13 November 2002); https://doi.org/10.1117/12.469048

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