Reliable subnanometer repeatability for CD metrology in a reticle production environment

Andrew C. Hourd; Anthony Grimshaw; Gerd Scheuring; Christian Gittinger; Stefan Doebereiner; Frank Hillmann; Hans-Juergen Brueck; Shiuh-Bin Chen; Parkson W Chen; Rik M. Jonckheere; Vicky Philipsen; Hans Hartmann; Volodymyr Ordynskyy; Kai Peter; Thomas Schaetz; Karl Sommer

doi:10.1117/12.468090

27 December 2002 Reliable Sub-Nanometer Repeatability for CD Metrology in a Reticle Production Environment

Andrew C. Hourd, Anthony Grimshaw, Gerd Scheuring, Christian Gittinger, Stefan Doebereiner, Frank Hillmann, Hans-Juergen Brueck, Shiuh-Bin Chen, Parkson W Chen, Rik M. Jonckheere, Vicky Philipsen, Hans Hartmann, Volodymyr Ordynskyy, Kai Peter, Thomas Schaetz, Karl Sommer

Author Affiliations +

Proceedings Volume 4889, 22nd Annual BACUS Symposium on Photomask Technology; (2002) https://doi.org/10.1117/12.468090
Event: Photomask Technology 2002, 2002, Monterey, CA, United States

Abstract

The new MueTec , an advanced CD metrology and review station operating at DUV (248nm) wavelength, has been extensively characterised in a reticle production environment. Performance data including resolution, measurement repeatability and throughput will be discussed. The system has demonstrated the ability to image 100nm Cr lines and sub-nanometer (3-sigma) long-term repeatability on lines and spaces down to 200nm in size. Metrology capability on contact hole and serif structures will also be discussed. The paper will also introduce the application of a long working distance DUV objective compatible with pelliclised masks. With a 9% EAPSM reticle for 193nm wavelength a very appropriate image contrast was obtained with both objective types, allowing reliable automated linearity measurements on this type of reticle also. In addition to the metrology performance of the tool, its integration into a manufacturing environment will also be described. This will show how the availability of networked co-ordinate data (either in the form of ASCII files or CATS data) and the high-accuracy stage of the tool enable efficient, automated measurement of large numbers of dense features under production conditions.

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Andrew C. Hourd, Anthony Grimshaw, Gerd Scheuring, Christian Gittinger, Stefan Doebereiner, Frank Hillmann, Hans-Juergen Brueck, Shiuh-Bin Chen, Parkson W Chen, Rik M. Jonckheere, Vicky Philipsen, Hans Hartmann, Volodymyr Ordynskyy, Kai Peter, Thomas Schaetz, and Karl Sommer "Reliable Sub-Nanometer Repeatability for CD Metrology in a Reticle Production Environment", Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, (27 December 2002); https://doi.org/10.1117/12.468090

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