Paper
29 June 1984 Automatic Inspection Of Contaminants On Reticles
Masataka Shiba, Mitsuyoshi Koizumi, Teiji Katsuta
Author Affiliations +
Abstract
Wafer steppers require contaminant-free reticles to assure high yield. This paper describes a new particle detection technique. A linearly polarized He-Ne laser beam scans obliquely across the reticle surface and only scattering light produced by the particles is detected by the detectors, which consist of analyzers, collection lenses, slits, and PMTs (photomultipliers). On the other hand, scattering light produced by the pattern edges on the reticle is cut off by the analyzers. Using this technique, particles as small as 2 1im on the surface of pellicle-installed reticles can be detected.
© (1984) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Masataka Shiba, Mitsuyoshi Koizumi, and Teiji Katsuta "Automatic Inspection Of Contaminants On Reticles", Proc. SPIE 0470, Optical Microlithography III: Technology for the Next Decade, (29 June 1984); https://doi.org/10.1117/12.941922
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CITATIONS
Cited by 2 scholarly publications and 1 patent.
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KEYWORDS
Reticles

Light scattering

Scattering

Laser scattering

Particles

Inspection

Pellicles

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