New photomask patterning method based on KrF stepper

Tae-Jung Ha; Yong-Kyoo Choi; Oscar Han

doi:10.1117/12.474517

30 July 2002 New photomask patterning method based on KrF stepper

Tae-Jung Ha, Yong-Kyoo Choi, Oscar Han

Proceedings Volume 4691, Optical Microlithography XV; (2002) https://doi.org/10.1117/12.474517
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

To solve the very low throughput of an e-beam writer in mask fabrication, a new patterning method based on a step-and-repeat exposure system, that is a photomask repeater, has been developed. In this paper, we intended to clarify the feasibility of 0.15 micrometers generation mask fabrication with the KrF photomask repeater. Inter-field registration accuracy (3sigma) in the photomask repeater is 14.9 nm in X direction and 29.1 nm in Y direction and can meet the registration specification (30 nm) of a 0.15 micrometers generation mask. Intra-field mis-registration caused by stepper lens distortion is 14 nm (3sigma) in X direction and 12 nm in Y direction for a 12 mm X 12 mm field and gets larger with an increase of a field size. Inter-field CD uniformity (3sigma) is 15.7 nm in 122.5 mm X122.5 mm mask area and intra-field CD uniformity is 10.3 nm in 12 mm X 12 mm field area. The sum of inter-field and intra-field value in the KrF photomask repeater don't currently satisfy the 30 nm registration and 15 nm CD uniformity specification of a 0.15 micrometers generation mask. So we need to reduce the registration and CD errors with optimizing PR coating and development process, using a small field size and compensating the errors of intra-field factors to a mother mask.

Citation Download Citation

Tae-Jung Ha, Yong-Kyoo Choi, and Oscar Han "New photomask patterning method based on KrF stepper", Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); https://doi.org/10.1117/12.474517

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
9 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Photomasks

Critical dimension metrology

Electron beam lithography

Mask making

Contamination

Coating

Scanning electron microscopy

Show All Keywords

Keywords/Phrases

Search In:

Publication Years