Implementation of phase-shift focus monitor with modified illumination

Shuji Nakao; Shinroku Maejima; Atsushi Ueno; Shigenori Yamashita; Junji Miyazaki; Akira Tokui; Kouichirou Tsujita; Ichiriou Arimoto

doi:10.1117/12.474643

30 July 2002 Implementation of phase-shift focus monitor with modified illumination

Shuji Nakao, Shinroku Maejima, Atsushi Ueno, Shigenori Yamashita, Junji Miyazaki, Akira Tokui, Kouichirou Tsujita, Ichiriou Arimoto

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Proceedings Volume 4691, Optical Microlithography XV; (2002) https://doi.org/10.1117/12.474643
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

For the convenience of practical use of phase shift focus monitor (PSFM), which has been developed by T. Brunner, imaging characteristics of PSFM are investigated under modified illumination by optical image calculations and printing experiments. Although the mechanism of pattern shift with focus offset under modified illumination is different from that for conventional high coherent illumination, sufficient sensitivity for precise focus monitoring is predicted by optical image calculations. Also, it is revealed that reduction of NA, i.e., localizing illumination at the peripheral part of pupil is effective to obtain higher sensitivity. By experiments, predicted characteristics are observed and similar sensitivity to that in conventional high coherent illumination is confirmed both for annular and quadrupole illuminations.

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Shuji Nakao, Shinroku Maejima, Atsushi Ueno, Shigenori Yamashita, Junji Miyazaki, Akira Tokui, Kouichirou Tsujita, and Ichiriou Arimoto "Implementation of phase-shift focus monitor with modified illumination", Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); https://doi.org/10.1117/12.474643

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