Effect of aberrations on defect printing and inspection

Paul D. Harris; Martin McCallum

doi:10.1117/12.474533

30 July 2002 Effect of aberrations on defect printing and inspection

Paul D. Harris, Martin McCallum

Proceedings Volume 4691, Optical Microlithography XV; (2002) https://doi.org/10.1117/12.474533
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

As we introduce alternating phase-shifting masks (altPSM) to production we have been very aware of our inability to detect quartz defects in the phase-shifted well. Much work has been completed to establish the printability of various defects. This paper will show, using rigorous three dimensional electro-magnetic simulation, that it is the effect upon the aerial image of the surrounding features and the resultant CD variation that is most critical, not the actual printing of the defects. Data will be presented showing that smaller defects in the center of the shifted space than at the edge of the space cause the allowable CD variation to be reached. It will also be shown that the most sensitive position for a quartz defect in a shifted space is not at the edge or center of the space, but rather at a point between these two. We will further present work showing that asymmetrical aberrations enhance the effects of these defects, especially at defocus, while symmetric aberrations reduce the effect. We will then use advanced techniques, that take into account the extra non-planar incident waves we must consider in 1X imaging, to establish how these defects are 'seen' by 1X actinic mask inspection systems. In 1X imaging we will show again how the transmitted aerial images of these defects are effected by the aberrations present.

Citation Download Citation

Paul D. Harris and Martin McCallum "Effect of aberrations on defect printing and inspection", Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); https://doi.org/10.1117/12.474533

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