Development of low-loss optical coatings for 157-nm lithography

Ryuji Biro; Kazuho Sone; Shunsuke Niisaka; Minoru Otani; Yasuyuki Suzuki; Chidane Ouchi; Tadahiko Saito; Masanobu Hasegawa; Jun Saito; Akira Tanaka; Akira Matsumoto

doi:10.1117/12.474550

30 July 2002 Development of low-loss optical coatings for 157-nm lithography

Ryuji Biro, Kazuho Sone, Shunsuke Niisaka, Minoru Otani, Yasuyuki Suzuki, Chidane Ouchi, Tadahiko Saito, Masanobu Hasegawa, Jun Saito, Akira Tanaka, Akira Matsumoto

Author Affiliations +

Proceedings Volume 4691, Optical Microlithography XV; (2002) https://doi.org/10.1117/12.474550
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

In the F₂ laser lithography, it is essential to reduce the loss of the optical coatings deposited on calcium fluoride lenses. In order to make low loss optical coatings, we have developed measurement apparatus, evaluated the coatings with various analyses, and found a correlation with the optical constants. In this paper we describe the optical loss measurement apparatus and the evaluation results analyzed for either single layer coatings or multi-layer anti-reflection coatings.

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Ryuji Biro, Kazuho Sone, Shunsuke Niisaka, Minoru Otani, Yasuyuki Suzuki, Chidane Ouchi, Tadahiko Saito, Masanobu Hasegawa, Jun Saito, Akira Tanaka, and Akira Matsumoto "Development of low-loss optical coatings for 157-nm lithography", Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); https://doi.org/10.1117/12.474550

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