Trace metal removal from microlithography process chemicals: Part I. photoresist solvents

Hsiao-Show Mike Tseng; Xiaoping Ling

doi:10.1117/12.474283

24 July 2002 Trace metal removal from microlithography process chemicals: Part I. photoresist solvents

Hsiao-Show Mike Tseng, Xiaoping Ling

Proceedings Volume 4690, Advances in Resist Technology and Processing XIX; (2002) https://doi.org/10.1117/12.474283
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

A novel filtration technique was developed and implemented to study the effect of CUNO Zeta Plus filtration on metal removal from a number of photoresist chemical systems. To obtain consistent metal removal performance, it was found that it was necessary to remove extraneous contaminants from the filtration system prior to actual filtration. A rinse-up protocol was developed and followed for the filtration system and filter medium. The EC and 40Q grades of Zeta Plus were employed in single stage as well as serial multi-stage filtration to remove metal ions from a wide range of microlithography process chemicals. The metal concentration was determined by Atomic Absorption Spectrometry for the influent and effluent samples before and after Zeta Plus filtration. The results showed 90% or greater reduction of the metal levels after single pass filtration. Three photoresist solvents were selected as examples to demonstrate the metal removal performance of Zeta Plus filtration.

Citation Download Citation

Hsiao-Show Mike Tseng and Xiaoping Ling "Trace metal removal from microlithography process chemicals: Part I. photoresist solvents", Proc. SPIE 4690, Advances in Resist Technology and Processing XIX, (24 July 2002); https://doi.org/10.1117/12.474283

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