CONFERENCE PROCEEDINGS
Advanced Search
Home > Proceedings > Volume 4690 > Article
Paper
24 July 2002 Synergic effect of acetal-based resin by blending with poly[4-hydroxy styrene-co-tert-butyl acrylate-co-4-(3-cyano-1,5-di-tert-butyl carbonyl pentyl styrene)] (P(HS-TBA-CBPS)) on the profiles of 248 nm chemically amplified resist
Hyun-Jin Kim, Yoon-Sik Chung, Dong Hwal Lee, Sook Hee Cho, Kwang Hwyi Im, Yun-Gill Yim, Deog-Bae Kim, Jae-Hyun Kim
Author Affiliations +
Proceedings Volume 4690, Advances in Resist Technology and Processing XIX; (2002) https://doi.org/10.1117/12.474265
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States
Abstract
We prepared ter-polymer of hydroxystyrene, tert-butyl acrylate and 4-(3-cyano-1,5-di-tert-butyl carbonyl pentyl styrene) (P(HS-TBA-CBPS)) and discussed a characteristic of prepared polymer. As TBA, newly introduced monomer increases, contrast of resist is improved. And the prepared polymer was blended with poly(4-hydroxystyrene-co-4-(1-ethylethoxystyrene)) (EE-PHS). The synergic effect on a resist performance in KrF lithography by the combination of high and low activation energy system was shown. A resist using blending polymer was shown a good performance on resolution and LER(Line Edge Roughness) than resist using polymer separately. Based on the results, it was found that high performance KrF resist could be obtained by optimization of polymer blending.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Citation Download Citation
Hyun-Jin Kim, Yoon-Sik Chung, Dong Hwal Lee, Sook Hee Cho, Kwang Hwyi Im, Yun-Gill Yim, Deog-Bae Kim, and Jae-Hyun Kim "Synergic effect of acetal-based resin by blending with poly[4-hydroxy styrene-co-tert-butyl acrylate-co-4-(3-cyano-1,5-di-tert-butyl carbonyl pentyl styrene)] (P(HS-TBA-CBPS)) on the profiles of 248 nm chemically amplified resist", Proc. SPIE 4690, Advances in Resist Technology and Processing XIX, (24 July 2002); https://doi.org/10.1117/12.474265
ACCESS THE FULL ARTICLE
ORGANIZATIONAL
Sign in with credentials provided by your organization.
INSTITUTIONAL
Select your institution to access the SPIE Digital Library.
SELECT YOUR INSTITUTION
PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.
PERSONAL SIGN IN
No SPIE Account? Create one
PURCHASE THIS CONTENT
SUBSCRIBE TO DIGITAL LIBRARY
50 downloads per 1-year subscription
Members: $195
Non-members: $335 ADD TO CART
25 downloads per 1 - year subscription
Members: $145
Non-members: $250 ADD TO CART
PURCHASE SINGLE ARTICLE
Includes PDF, HTML & Video, when available
Members: $17.00
Non-members: $21.00 ADD TO CART
PROCEEDINGS
 9 PAGES
DOWNLOAD PAPER SAVE TO MY LIBRARY
GET CITATION
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Polymers
Lithography
Line edge roughness
Polymerization
Transmittance
Scanning electron microscopy
Etching
RELATED CONTENT
Subscribe to Digital Library
Receive Erratum Email Alert
Back to Top