Aliphatic platforms for the design of 157-nm chemically amplified resists

Hiroshi Ito; Hoa D. Truong; Masaki Okazaki; Dolores C. Miller; Nicolette Fender; Gregory Breyta; Phillip J. Brock; Gregory M. Wallraff; Carl E. Larson; Robert D. Allen

doi:10.1117/12.474223

24 July 2002 Aliphatic platforms for the design of 157-nm chemically amplified resists

Hiroshi Ito, Hoa D. Truong, Masaki Okazaki, Dolores C. Miller, Nicolette Fender, Gregory Breyta, Phillip J. Brock, Gregory M. Wallraff, Carl E. Larson, Robert D. Allen

Author Affiliations +

Proceedings Volume 4690, Advances in Resist Technology and Processing XIX; (2002) https://doi.org/10.1117/12.474223
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

Our primary platform for 157 nm positive resists is built on a copolymer of t-butyl 2-trifluoromethylacrylate (TBTFMA) and norbornene bearing hexafluoroisopropanol (NBHFA) as an acid group, which is prepared by radical copolymerization. The radical copolymerization of 2-trifluoromethylacrylic monomers with norbornene derivatives has been found through reactivity ratio determination and in situ ¹H NMR analysis of kinetics to deviate from the terminal model but to follow the penultimate model. These copolymers typically contain >50 mol% TBTFMA, are lipophilic, and fail to provide good imaging due to poor wettability. Blending a homopolymer of NBHFA (optical density (OD)=1.7/micrometers at 157 nm) into the copolymers (OD=2.5-2.7/micrometers ) increases the hydrophilicity and reduces OD to 2.2-2.0/micrometers , providing high resolution images. Another platform we have identified is a copolymer of TBTFMA with vinyl ethers, which can be prepared by using a common radical initiator. Some of the vinyl ether copolymers are also homogeneously miscible with the NBHFA homopolymer and thus their OD and aqueous base development can be improved by blending.

Citation Download Citation

Hiroshi Ito, Hoa D. Truong, Masaki Okazaki, Dolores C. Miller, Nicolette Fender, Gregory Breyta, Phillip J. Brock, Gregory M. Wallraff, Carl E. Larson, and Robert D. Allen "Aliphatic platforms for the design of 157-nm chemically amplified resists", Proc. SPIE 4690, Advances in Resist Technology and Processing XIX, (24 July 2002); https://doi.org/10.1117/12.474223

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available