High-resolution photomask transmission and phase measurement tool

Jim J. Jacob; Tim Litvin; Andrew J. Merriam

doi:10.1117/12.473409

16 July 2002 High-resolution photomask transmission and phase measurement tool

Jim J. Jacob, Tim Litvin, Andrew J. Merriam

Proceedings Volume 4689, Metrology, Inspection, and Process Control for Microlithography XVI; (2002) https://doi.org/10.1117/12.473409
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

Acintic measurements of optical transmission are critical for determining the quality of repairs on advanced ArF- generation photomasks. We describe a new 193 nm tool designed to provide mask makers and uses the capability to resolve and measure photomask features with dimensions less than 0.20 micron. Measurements of transmission with sub-1 percent error are achieved in 30 seconds by using a laser probe beam imaged onto the top of the mask surface. We present high-resolution actinic images of embedded attenuator phase shift masks and of binary masks and discuss various methods and results of measuring mask transmission. A scheme to add phase retardation measurement capability to the tool is described, and preliminary results are discussed.

Citation Download Citation

Jim J. Jacob, Tim Litvin, and Andrew J. Merriam "High-resolution photomask transmission and phase measurement tool", Proc. SPIE 4689, Metrology, Inspection, and Process Control for Microlithography XVI, (16 July 2002); https://doi.org/10.1117/12.473409

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