New PTB reflectometer for the characterization of large optics for the extreme ultraviolet spectral region

Johannes Tuemmler; Frank Scholze; Guido M.L. Brandt; Bernd Meyer; Frank Scholz; Katrin Vogel; Gerhard Ulm; Michael Poier; Udo Klein; Wolfgang Diete

doi:10.1117/12.472307

1 July 2002 New PTB reflectometer for the characterization of large optics for the extreme-ultraviolet spectral region

Johannes Tuemmler, Frank Scholze, Guido M.L. Brandt, Bernd Meyer, Frank Scholz, Katrin Vogel, Gerhard Ulm, Michael Poier, Udo Klein, Wolfgang Diete

Author Affiliations +

Proceedings Volume 4688, Emerging Lithographic Technologies VI; (2002) https://doi.org/10.1117/12.472307
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

Since 1986, the Physikalisch Technische Bundesanstalt (PTB), Germany's national metrology institute, has been working on the 'at-wavelength' characterization of VUV and EUV optical components with synchrotron radiation. Today, PTB operates a laboratory at the electron storage ring BESSY II. Here, at several beamlines, high-accuracy at-wavelength characterization of EUVL components is routinely carried out. Reflectometry is performed on a bending magnet beamline at which a relative uncertainty of 0.25 percent is achieved for the spectral reflectance of a mirror in the EUV spectral region. For the investigation of very large optical components, a new reflectometer will be set up at the soft x-ray radiometry beamline in March 2002. The reflectometer allows the characterization of full size EUVL optical components. Raster scans across the full sample surface can be performed in. Convex or concave profiles are allowed. An additional detector movement out of the scattering plane allows the measurement of bi-directional scattering. Similar measurements can be performed by mounting a cooled CCD camera at different fixed positions on the vacuum chamber. The motor step size for all translational and rotational movements will be 1 micrometers and 0.001 degrees, respectively. We present a detailed description of the new reflectometer for large EUV optics and discuss the uncertainties to be achieved for reflectance measurements.

Citation Download Citation

Johannes Tuemmler, Frank Scholze, Guido M.L. Brandt, Bernd Meyer, Frank Scholz, Katrin Vogel, Gerhard Ulm, Michael Poier, Udo Klein, and Wolfgang Diete "New PTB reflectometer for the characterization of large optics for the extreme-ultraviolet spectral region", Proc. SPIE 4688, Emerging Lithographic Technologies VI, (1 July 2002); https://doi.org/10.1117/12.472307

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available