Microstructuring irradiated by 197- and 308-nm excimer lasers

Qihong Lou; Lin Zhang

doi:10.1117/12.446604

29 October 2001 Microstructuring irradiated by 197- and 308-nm excimer lasers

Qihong Lou, Lin Zhang

Proceedings Volume 4595, Photonic Systems and Applications; (2001) https://doi.org/10.1117/12.446604
Event: International Symposium on Photonics and Applications, 2001, Singapore, Singapore

Abstract

In this paper, a fast process of fabrication of diffractive optical elements by excimer laser ablation of polymer films is mainly described. Dammann grating on PI and PC materials with feature size of 2 micrometers are successfully fabricated.

Citation Download Citation

Qihong Lou and Lin Zhang "Microstructuring irradiated by 197- and 308-nm excimer lasers", Proc. SPIE 4595, Photonic Systems and Applications, (29 October 2001); https://doi.org/10.1117/12.446604

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