Practical complementary mask-data generation for EPL stencil masks using general geometrical operation tools

Akemi Moniwa; Fumio Murai

doi:10.1117/12.458368

11 March 2002 Practical complementary mask-data generation for EPL stencil masks using general geometrical operation tools

Akemi Moniwa, Fumio Murai

Author Affiliations +

Proceedings Volume 4562, 21st Annual BACUS Symposium on Photomask Technology; (2002) https://doi.org/10.1117/12.458368
Event: Photomask 2001, 2001, Monterey, CA, United States

Abstract

Electron beam projection lithography (EPL) using stencil masks is one of the most promising techniques in 50-70-nm- node lithography. However, in most real situations, stencil masks have to be divided into two complementary masks due to the 'doughnut pattern' problem as well as mechanical problems. This paper describes our complementary mask-data generation method that uses a pattern operation tool for conventional design-rule checking (DRC) and a phase-shift- mask (PSM) general tool, both of which are made by Mentor Graphics. Layout patterns are divided into pieces with the DRC tool and the pieces are alternately distributed between two layers with the PSM generation tool. The advantages of using these commercial DA tools include a high processing speed based on the maintenance of a hierarchical data structure, high reliability, and flexibility in changing generation rules. We used this method for metal-layer data of a 14 X 14-mm test chip. Although the original data included more than 3000 doughnut patterns, the obtained complementary data had no doughnut patterns. The aperture densities of the two complementary masks were almost equal. Because the CPU time required for data generation was about 20 minutes with a 500-MHz PC having 256-Mbyte memory, we believe that the proposed method is a valuable tool for complementary mask-data generation.

Citation Download Citation

Akemi Moniwa and Fumio Murai "Practical complementary mask-data generation for EPL stencil masks using general geometrical operation tools", Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002); https://doi.org/10.1117/12.458368

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
11 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Photomasks

Scattering

Electron beam lithography

Electron beams

Semiconducting wafers

Lithography

Projection lithography

Show All Keywords

Keywords/Phrases

Search In:

Publication Years