Measurement of the magnitude of triboelectrification in the environment of the 157-nm stepper

Lawrence Levit; Wei Guan

doi:10.1117/12.458305

11 March 2002 Measurement of the magnitude of triboelectrification in the environment of the 157-nm stepper

Lawrence Levit, Wei Guan

Proceedings Volume 4562, 21st Annual BACUS Symposium on Photomask Technology; (2002) https://doi.org/10.1117/12.458305
Event: Photomask 2001, 2001, Monterey, CA, United States

Abstract

Electrostatic charge on reticles and adjacent objects is a growing and significant source of damage to reticles . Next generation exposure tools will likely employ vacuum ultraviolet light (157 nm.) to achieve improvements in spatial resolution. Because, air is opaque such light due to the presence of oxygen and water vapor , these exposure tools will need to operate in a nitrogen atmosphere. In order to benchmark the magnitude of static charge in 157 nm. exposure tools, the efficiency of tribocharging was measured in a test chamber with atmospheres of 10-60 percent RH air and in nitrogen. The data shows that the dependence of tribocharging on humidity is generally higher as humidity is decreased. Tribocharging in a nitrogen environment is different than in 10 percent RH air and is substantially higher than in the environment of a conventional air-filled stepper. That suggests that maintaining the safety of reticles in the 157 nm. lithography era will require a rigorous electrostatic management program.

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Lawrence Levit and Wei Guan "Measurement of the magnitude of triboelectrification in the environment of the 157-nm stepper", Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002); https://doi.org/10.1117/12.458305

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KEYWORDS

Humidity

Reticles

Nitrogen

Quartz

Oxygen

Atmospheric physics

Electrons

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