Micromachining of ultrananocrystalline diamond

Nicolai A. Moldovan; Orlando H. Auciello; Anirudha Sumant; John Carlisle; Ralu Divan; Dieter M. Gruen; Alan R. Krauss; Derrick C. Mancini; A. Jayatissa; John Tucek

doi:10.1117/12.442958

28 September 2001 Micromachining of ultrananocrystalline diamond

Nicolai A. Moldovan, Orlando H. Auciello, Anirudha Sumant, John Carlisle, Ralu Divan, Dieter M. Gruen, Alan R. Krauss, Derrick C. Mancini, A. Jayatissa, John Tucek

Author Affiliations +

Proceedings Volume 4557, Micromachining and Microfabrication Process Technology VII; (2001) https://doi.org/10.1117/12.442958
Event: Micromachining and Microfabrication, 2001, San Francisco, CA, United States

Abstract

Ultrananocrystalline diamond (UNCD) with grain sizes in the range of 2 - 5 nm is produced using a microwave plasma chemical vapor deposition process with argon-rich C₆₀ or CH₄ plasmas. This material has excellent mechanical properties: high hardness and Young modulus, and an extremely low friction coefficient (approximately 0.01). It is resistant to chemical attack, and is potentially biocompatible. These properties make UNCD a very good candidate for a diamond-based microelectromechanical systems (MEMS) technology. We report on the micromachinability of this material by selective seeding, selective growth and reactive ion etching, in conjunction with SiO₂ sacrificial layers for fabricating 3-D structures with freestanding or movable parts. These micromachining techniques are used to develop a totally UNCD-made turbine as a demonstration for UNCD-based MEMS.

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Nicolai A. Moldovan, Orlando H. Auciello, Anirudha Sumant, John Carlisle, Ralu Divan, Dieter M. Gruen, Alan R. Krauss, Derrick C. Mancini, A. Jayatissa, and John Tucek "Micromachining of ultrananocrystalline diamond", Proc. SPIE 4557, Micromachining and Microfabrication Process Technology VII, (28 September 2001); https://doi.org/10.1117/12.442958

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