Paper
9 July 2001 Thin film morphology at low adatom mobility
Robert A. Knepper, Russell F. Messier
Author Affiliations +
Abstract
Thin film properties can be engineered by the high degree of control in many CVD and especially PVD processes. In particular, the thin film morphology often has a direct connection between preparation and property relations. This review will focus on understanding the morphology in PVD coatings prepared at low adatom mobilities where columnar thin films are prepared, with the column sizes ranging from nm- to micrometers -sizes and the columns forming hierarchical clusters of columns having a fractal-like behavior. We will discuss the effects of ion bombardments and angle of incidence of the directional vapor species with respect to the morphology origin and evolution. These various morphologies are related to applications ranging from hard coatings to optical coatings to sculptured thin films.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Robert A. Knepper and Russell F. Messier "Thin film morphology at low adatom mobility", Proc. SPIE 4467, Complex Mediums II: Beyond Linear Isotropic Dielectrics, (9 July 2001); https://doi.org/10.1117/12.432957
Lens.org Logo
CITATIONS
Cited by 5 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Thin films

Ions

3D modeling

Sputter deposition

Particles

Scanning electron microscopy

Thin film coatings

RELATED CONTENT


Back to Top