Minimizing Fizeau fringes during the contact printing of diffraction gratings

Dino R. Ciarlo; Michael C. Rushford; Paul J. Kuzmenko; Jian Ge

doi:10.1117/12.448041

9 November 2001 Minimizing Fizeau fringes during the contact printing of diffraction gratings

Dino R. Ciarlo, Michael C. Rushford, Paul J. Kuzmenko, Jian Ge

Proceedings Volume 4440, Lithographic and Micromachining Techniques for Optical Component Fabrication; (2001) https://doi.org/10.1117/12.448041
Event: International Symposium on Optical Science and Technology, 2001, San Diego, CA, United States

Abstract

An index matching fluid has been used to minimize the effect of interference fringes which develop when contact printing diffraction gratings on silicon wafers. These fringes are the result of interference effects when there is a small but uneven gap between the photomask and resist surface. They are especially troublesome when printing and etching large area, coarse diffraction gratings on the surface of silicon wafers and silicon disks.

Citation Download Citation

Dino R. Ciarlo, Michael C. Rushford, Paul J. Kuzmenko, and Jian Ge "Minimizing Fizeau fringes during the contact printing of diffraction gratings", Proc. SPIE 4440, Lithographic and Micromachining Techniques for Optical Component Fabrication, (9 November 2001); https://doi.org/10.1117/12.448041

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