Wavelength stabilization in an excimer laser source using piezoelectric active vibration control

Ronald L. Spangler Jr.; Robert N. Jacques; Daniel Brown; J. Martin Algots; William N. Partlo

doi:10.1117/12.435653

14 September 2001 Wavelength stabilization in an excimer laser source using piezoelectric active vibration control

Ronald L. Spangler Jr., Robert N. Jacques, Daniel Brown, J. Martin Algots, William N. Partlo

Proceedings Volume 4346, Optical Microlithography XIV; (2001) https://doi.org/10.1117/12.435653
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

Excimer laser light sources for photolithography are subject to a cycle of ever-tightening precision requirements, dictated by the design-rule shrinks planned into the industry roadmap. But pulse-to-pulse stability of the center wavelength of the emitted light is limited by the presence of vibration in key components and structures. This paper covers the application of Active Vibration Control (AVC) technology to an excimer laser to mitigate the effects unwanted vibration, and enable compliance with anticipated future stability specifications. The laser system is described, from a structural-dynamics point of view. A systematic approach to vibration diagnostics is presented, with experimental results to support key conclusions regarding the types and sources of vibrations. Next, analytical assessment of active control performance is discussed, followed by breadboard-type implementation results showing reductions of > 30% in a key stability performance metric.

Citation Download Citation

Ronald L. Spangler Jr., Robert N. Jacques, Daniel Brown, J. Martin Algots, and William N. Partlo "Wavelength stabilization in an excimer laser source using piezoelectric active vibration control", Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); https://doi.org/10.1117/12.435653

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