Printing high-density patterns with dark-field 193-nm lithography

Obert R. Wood II; Donald L. White; Donald M. Tennant; Raymond A. Cirelli; James R. Sweeney; Myrtle I. Blakey; Joseph E. Griffith

doi:10.1117/12.435686

14 September 2001 Printing high-density patterns with dark-field 193-nm lithography

Obert R. Wood II, Donald L. White, Donald M. Tennant, Raymond A. Cirelli, James R. Sweeney, Myrtle I. Blakey, Joseph E. Griffith

Author Affiliations +

Proceedings Volume 4346, Optical Microlithography XIV; (2001) https://doi.org/10.1117/12.435686
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

In dark-field (DF) lithography, light from the condenser illuminates the reticle at such a steep angle that non- diffracted light is lost from the system. A DF reticle contains a series of sub-resolution amplitude gratings to diffract light from the condenser into the projection lens and, thus, to precisely control the amplitude, phase and direction of light from every point on the reticle. In this paper we show how DF lithography can be used to print high- density patterns at higher contrast than is currently possible with conventional 193-nm lithography in a single exposure.

Citation Download Citation

Obert R. Wood II, Donald L. White, Donald M. Tennant, Raymond A. Cirelli, James R. Sweeney, Myrtle I. Blakey, and Joseph E. Griffith "Printing high-density patterns with dark-field 193-nm lithography", Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); https://doi.org/10.1117/12.435686

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