Marathon evaluation of optical materials for 157-nm lithography

Vladimir Liberman; Mordechai Rothschild; N. N. Efremow Jr.; Stephen T. Palmacci; Jan H. C. Sedlacek; Chris K. Van Peski; Kevin J. Orvek

doi:10.1117/12.435759

14 September 2001 Marathon evaluation of optical materials for 157-nm lithography

Vladimir Liberman, Mordechai Rothschild, N. N. Efremow Jr., Stephen T. Palmacci, Jan H. C. Sedlacek, Chris K. Van Peski, Kevin J. Orvek

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Proceedings Volume 4346, Optical Microlithography XIV; (2001) https://doi.org/10.1117/12.435759
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

In this work we present progress on the long-term evaluation of optical materials for 157-nm lithographic applications. We review the unique metrology capabilities that have been developed for accurately assessing optical properties of samples both online and offline, utilizing VUV spectrophotometry with in-situ lamp-based cleaning. We review the current status of bulk materials for lenses, such as CaF₂ and BaF₂, and durability results of antireflectance coatings. Finally, we describe progress on materials testing of organic pellicles, both with 172-nm lamps as well as under 157-nm laser irradiation.

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Vladimir Liberman, Mordechai Rothschild, N. N. Efremow Jr., Stephen T. Palmacci, Jan H. C. Sedlacek, Chris K. Van Peski, and Kevin J. Orvek "Marathon evaluation of optical materials for 157-nm lithography", Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); https://doi.org/10.1117/12.435759

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