High-resolution multigrating spectrometer for high-quality deep-UV light source production

Toru Suzuki; Hirokazu Kubo; Takashi Suganuma; Toshio Yamashita; Osamu Wakabayashi; Hakaru Mizoguchi

doi:10.1117/12.435662

14 September 2001 High-resolution multigrating spectrometer for high-quality deep-UV light source production

Toru Suzuki, Hirokazu Kubo, Takashi Suganuma, Toshio Yamashita, Osamu Wakabayashi, Hakaru Mizoguchi

Proceedings Volume 4346, Optical Microlithography XIV; (2001) https://doi.org/10.1117/12.435662
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

Deep UV lithography using ArF excimer laser requires very narrower spectral properties. However, spectrometers that have sufficient resolution to evaluate the ArF excimer laser are commercially not available. High-resolution multi-grating spectrometers for measuring spectral bandwidth at full width at half maximum (FWHM) and spectral purity of ArF excimer lasers are introduced. To achieve high resolution, a special grating arrangement called HEXA (Holographic and Echelle Gratings Expander Arrangement) is designed. A holographic grating and an echelle grating are used so that the input light is expanded and diffracted several times. The resolution of the HEXA spectrometer is more than two million. To evaluate the resolution and the stability of the spectrometer, we measured the instrument function by a coherent light source whose wavelength is same as ArF excimer laser. The experimentally obtained resolution of the spectrometer is 0.09pm or 0.05pm that is selectable. The measured dispersion has a good agreement with the theoretical value. To evaluate the spectral properties of excimer lasers, the instrument function must be very stable. This high-resolution spectrometer enables high quality control of line-narrowed ArF excimer laser mass production.

Citation Download Citation

Toru Suzuki, Hirokazu Kubo, Takashi Suganuma, Toshio Yamashita, Osamu Wakabayashi, and Hakaru Mizoguchi "High-resolution multigrating spectrometer for high-quality deep-UV light source production", Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); https://doi.org/10.1117/12.435662

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available